Aluminum Sputtering Target for PVD Coating

Min.Order: 1
Product origin: Changsha, Hunan, China
Infringement complaint: complaintComplaint
US$ 50 ~ 100

Description
Features of Aluminum Sputtering Targets

Chemical Composition: pure Al
Available Purity: 2N5, 3N, 4N, 5N, 5N5
Production Technology: melting
Shapes: planar targets, rotary targets
Average Grain Size: < 300um, structure of fine grains can be customized



Application of Aluminum Sputtering Targets

Aluminum Sputtering Targets are produced by melting technology, usually apply for optical coating and semiconductor field. With up to 5N purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.


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