Nicr20

Thin film coating material NiCr sputtering target

Product:
NiV 80:20wt%, other composition can be customized
Purity:
99.9%-99.95%
Size:
customized
Shape:
Planar and rotary
Technology:
Vacuum Melting
Application:
semiconductor field to deposit barrier or adhesion layers
Packing:
Vacumm sealed, wooden case

Nickel Chromium Sputtering Targets are produced by melting technology, it's used for depositing NiCr thin film. As this material has relatively large resistivity, more resistant to oxidation and low temperature coefficient of resistance, so NiCr thin films are widely used for making resistors thin film for IC application. Nickel chromium sputtering targets can also applied for low-E glass coating. With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Features
Chemical Composition: NiCr93/7wt%, NiCr90/10wt%, NiCr80/20wt%, NiCr70/30wt%, NiCr60/40wt%, NiCr40/60wt%,NiCr50/50wt%
Segregation of weight: +/-0.5wt%
Available Purity: 2N8, 3N, 3N5
Production Technology: melting
Shapes: planar targets

Related Products
Copper Nickel Titanium Sputtering Target
Nickel Vanadium Sputtering Target
Nickel Iron Sputtering Target

Company Profile:

Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
OUR ADVANTAGE

1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm



OUR SERVICE
Professional and efficient
We own a strong teamwork of professional R&D team,
manufacturing team, sales team and after-sales service team.
Provide you 12 hours fastest service.

PRODUCTION PROCESS