High Purity Element CAS 7440-42-8 2.34 G/Ml at 25 (Lit.) Amorphous 90%~96% Boron (B) Powder

Min.Order: 100
Product origin: Hefei, Anhui, China
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US$ 400 ~ 450

Description
Boron Powder
1.Molecular formula: B

2.Molecular weight: 
13.8348

3.HS CODE: 2804500010
 
4.CAS NO.: 7440-42-8
5.Storage: Packed in metal drums, according to the user's requirements, stored in a dry, ventilated warehouse, moisture-proof, mildew-proof, break-proof.
The elemental boron is black or dark brown powder, and the formation of boron trioxide film in the air prevents the internal boron oxidation. It can react with fluorine at room temperature and is not corroded by hydrochloric acid and hydrofluoric acid aqueous solution. Boron is insoluble in water, and the powdered form of boron is soluble in boiling nitric and sulfuric acids, as well as most molten metals such as copper, iron, manganese, aluminum, and calcium.
Grade
Purity 
Mg
Insoluble in H2O2
Water soluble boron
Avg. Particle Size (D50)
B85
85%~88%
≤12.0%
≤ 1.5%
≤ 1.0%
≤ 1µm
B90
90%~92%
≤6.0%
≤ 1.0%
≤ 0.5%
≤ 1µm
B95
95%~97%
≤2.0%
≤ 1.0%
≤ 0.5%
≤ 1µm
 
Product name
Boron Powder
CAS No.
7440-42-8
EINECS
231-151-2
Appearance
Brown powder or black power
Melting point
2300ºC
Packing 
Wooden case
Applications
1. Used for doping of semiconductor material silicon, high temperature resistant material, high temperature high power semiconductor and metal spraying additive.

2. Mainly used for special alloy steel smelting, can also be used as gas scavenger in molten copper, control rod in atomic reactor and rocket fuel making; In the electronics industry, the igniters are doped with the element boron; It can also be used as catalyst in medicine, ceramic industry and organic synthesis. It is a raw material for making various borides.

3. Used as semiconductor material silicon doping source, high-temperature high-power semiconductor device materials, infrared device materials.

4. Used as semiconductor dopant, high-purity reagents.

5. For powder metallurgy additives and thermal spraying and other surface coating materials, but also for the semiconductor industry.
 

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