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4-Ethenylphenol Acetate [Monomer] 4-Acetoxystyrene CAS 2628-16-2
4-Ethenylphenol Acetate [Monomer] 4-Acetoxystyrene CAS 2628-16-2
4-Ethenylphenol Acetate [Monomer] 4-Acetoxystyrene CAS 2628-16-2
4-Ethenylphenol Acetate [Monomer] 4-Acetoxystyrene CAS 2628-16-2
4-Ethenylphenol Acetate [Monomer] 4-Acetoxystyrene CAS 2628-16-2
4-Ethenylphenol Acetate [Monomer] 4-Acetoxystyrene CAS 2628-16-2

4-Ethenylphenol Acetate [Monomer] 4-Acetoxystyrene CAS 2628-16-2

Min.Order: 200
Product origin: Wuxi, Jiangsu, China
Infringement complaint: complaintComplaint
US$ 50 ~ 55

Description
4-Ethenylphenol Acetate monomer is mainly used in the synthesis of polyhydroxystyrene. Polyhydroxystyrene is the main component of photoresist which currently is the main body of the 248nm photoresist resin, which is mainly used in the field of microelectronic chips and liquid crystal displays.
Product name
4-Acetoxystyrene/4-Ethenylphenol acetate
CAS No.
2628-16-2
Molecular Formula
C10H10O2
Purity,%
99.0 min
Appearance
Colorless liquid
Clarity (10% methanol solvent)
Clear
Water,%
0.2max
Polymer,%
0.5max
Inhibitor( TBC/MEHQ)
200-300ppm
Al
10ppb max
Ca
10ppb max
Mg
10ppb max
Cu
10ppb max
Fe
10ppb max
Na
10ppb max
Ni
10ppb max
Zn
10ppb max
K
10ppb max
Mn
10ppb max
Cr
10ppb max
Sn
10ppb max
As
10ppb max
Packaging
25kgs/50kgs/100kgs/200kgs drum or client request


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