Description
Lithography is the most critical of all the basic processes. During the fabrication of the wafer, various physical components of the transistor, diode, capacitor, resistor, and metal layer are formed on the surface or surface of the wafer. These components are created on a mask layer each time, and combined with the formation of the film and the removal of specific portions, through the lithography process, the portion of the feature pattern is ultimately retained on the wafer. The goal of lithography production is to generate dimensionally accurate feature patterns based on circuit design requirements and to have the correct position on the wafer surface and the correct association with other parts.
Advantage:
1. Excellent heat dissipation design;
2, can be customized according to the drawings provided by customers;
3, high-quality optical glass material, good anti-aging performance, high light transmission, high temperature resistance, stable chemical properties;
4, mature optical processing technology, quality is guaranteed;
5, can provide a variety of high-quality materials to meet the different needs of customers;
6, excellent parallelism, flatness;
7. Maintain extremely low thickness tolerances;
8, glass micro-flow channel, precise etching micro-flow channel, accurate size;
typical application:
1. Biological research;
2. Clinical diagnostic equipment;
3. In vitro bionic model;
4. Organic synthesis;
5. Microreactor;
6. Chemical analysis;
The company can provide products with perfect quality and high technology content according to different needs of users. Our company is dedicated to providing customers with comprehensive after-sales service.
Complaint
