This semiconductor silicon ingot is widely used in semiconductor, liquid crystal display and many other fields thanks to its unique and superior properties.
Application
| Equipment | Parts |
Semiconductor
| Plasma etching equipment | Ring |
| Semiconductor | CVD equipment | Susceptor
Baffles |
Semiconductor
| Diffusion furnace, annealing furnace and other heating equipment | Heat homogenization plate |
Liquid Crystal Display
| Sputtering equipment | Sputtering target |
The high purity poly-crystalline silicon is used as raw material to make this semiconductor silicon ingot , and the purity is further improved by the crystallization self-cleaning technology.
Similar to mono-crystalline silicon, this semiconductor silicon ingot shows a smooth surface without crystal drop pits through washing and etching with acid solutions, which can meet the surface roughness requirements of components in most of application fields.
Most of the mechanical properties of this semiconductor silicon ingot are similar to those of mono-crystalline silicon, such as hardness, fracture toughness, machining characteristics, etc.
We have 20 furnaces with an average monthly output of 200 feedstock ingots. Shape, size and electrical resistivity can be customized according to customer requirements.
Complaint
