Complaint
| Light chamber design -Special materials to ensure that the light chamber deforms to minimum | ||
| Pasing Longge structure with diameter | Roland circle being 400mm | |
| Wavelength range | 134-680nm | |
| Pixel resolution | 10pm | |
| Constant temperature | 32.5 ±0.5°C | |
| Concave Grating | ||
| Engraved line density | 2400l/mm | |
| Primary spectral line dispersion rate | 1.04nm/mm | |
| Working Conditions | ||
| Working temperature | 15-30 °C | |
| Relative humidity | ≤70% | |
| Power supply | 220±5V, single-phase 50Hz, grounding resistance <10 | |
| The laboratory is expected to have no vibration, dust, strong electromagnetic interference, strong airflow, or corrosive gas. | ||
| Excitation light source | ||
| High energy plasma spark light source technology | High-energy pre-sparking technology (HEPS) | |
| Frequency | 100-1000Hz | |
| Excitation Platform | ||
| 3mm analysis spacing on sample platform | Spray electrode technique | |
| Dimension/Weight | ||
| H435mm, L900mm, W 600mm | 120 kg | |
| Power | ||
| Maximum power | 1500 W | |
| Standby power | 70 W | |
| Detector | ||
| High-performance linear array CMOS | ||
| Analysis time | ||
| 30 seconds or less, depending on sample type | ||
