Specification | Cylinder: 44L Valve: CGA640 Content:20kg; | |||
Cylinder: 440L Valve: CGA640 Content:200kg. | ||||
Application | 1.IC: as a gas cleaner in the semiconductor industry; Chemical vapor Deposition (CVD) 2.LCD: NF3 is used as an etching agent for liquid crystal display (LCD) processing. 3.Solar cells: NF3 as an etching and cleaning gas. |