3 Heads Compact RF Plasma Magnetron Sputtering Deposition System

Min.Order: 1
Product origin: Zhengzhou, Henan, China
Infringement complaint: complaintComplaint
US$ 25000 ~ 27000

Description
3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater -
 is a three head 1" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. (DC magnetron sputtering option is available upon request.)

 
Input Power
 
Single phase 220 VAC, 50 / 60 Hz
1000 W (including vacuum pump and water chiller)
If the voltage is 110 V, a 1500 W transformer can be ordered
Power Source


 
13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads
Load range: 0 - 80 oh adjustable. Tuning range: -200j - 200j adjustable
Rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched "in the plasma" (no breaking of vacuum and plasma during a multilayer process)
Optional 300 W auto-match RF generator is available at extra cost
Magnetron Sputtering Head
 
Three 1" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps
RF cable replacement can be purchased
One manually operated shutter is built on the flange  
One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads
Sputtering TargetTarget size requirement: 1" diameter x 1/8" thickness max
Sputtering distance range: 50 - 80 mm adjustable
Sputtering angle range: 0 - 25° adjustable 
1" diameter Cu target and Al2O3 target are included for demo testing
Various oxide 1" sputtering targets are available upon request at extra cost
Vacuum Chamber

 
Vacuum chamber:  256 mm OD x 238 mm ID x  276 mm Height, made of high purity quartz
Sealing flange: 274 mm Dia. made of Aluminum with high temperature silicone O-ring
Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber
Max vacuum level: 10^-4 Torr with optional turbo pump and chamber baking 
Sample Holder

 
Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover
Sample holder size: 50 mm Dia. for. 2" wafer max
Rotation speed: 1 - 10 rpm adjustable for uniform coating
The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller
Vacuum Pump 
 
KF40 vacuum port is built in for connecting to a vacuum pump.
Vacuum level: 10^-3 Torr with included dual stage mechanical pump
10^-4 Torr with optional turbo pump 
Size540 mm L x 540 mm W x 1000 mm H
Net Weight60 kg
ComplianceCE approval












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